Metrologia
e Qualidade - MEQ 7 |
Title
: |
SURFACE
QUALITY EVALUATION OF DIAMOND TURNED SEMICONDUCTOR CRYSTAL BY MEANS OF
ATOMIC FORCE MICROSCOPY |
Abstract
: |
The possibility of fabricating high quality components from brittle
materials has been made possible by achieving material removal in the
ductile mode. It is known that plastic behavior in brittle materials take
place prior to the onset of fracture when the cut is restricted below
critical cutting depth value. The surface integrity of any mechanical
component, finished by means of mechanical material removal process, is
considered to be critical for its performance. The importance of assessing
surface integrity of mechanically finished brittle materials such as
semiconductor crystals is strongly justified by the optical and electronic
applications. In this paper, the use of AFM for the evaluation of diamond
turned monocrystalline silicon surface finish is presented. (100) oriented
monocrystalline silicon was single point diamond turned under conditions
that lead to a ductile regime. 3-D image was used for the characterization
of surface quality. The cut grooves can be clearly seen, regularly spaced
and running parallel with cutting direction which confirm the absence of
chatter vibration. A machined surface with the maximum peak-to-valley
roughness of 25 nm can be generated at feedrate in the range of 1.5 and 2.0 mm/rev.
The surface roughness measured is in the range of 2 nm Ra. This surface
finish is slightly better than the polished samples used in the diamond
turning tests. A closer examination at higher magnifications of the machined
surface indicated that no microcracks are present. In this case single point
diamond turning has achieved fully ductile material removal. The results
demonstrate that the AFM is more suitable for the assessment of the of
diamond machined surfaces because of the better accuracy of the surface
roughness and evaluation of microtopography of the surface generated.
|
Autores
: |
Jasinevicius, Renato Goulart
da Silva, H. A.T
Montanari, L.
Tsukamoto, R.
Duduch, J. G.
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Trabalho
Completo : |
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1o.
Cobef | Comissão
Organizadora | Palestras |
Sessões Técnicas | Autor | Revisores |
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